TZTEK provides high precision and repeatability systems for mask metrology which are required during mask manufacturing. Masks could be GOG and PSM or others.
For the requirement of mask IQC in Fab, TZTEK provides long working distance objectives for protecting mask with pellicle. For CD measurement on the mask, system provides visible and UV illumination in both reflected and transmitted mode. The UV illumination can be used to measure the structure width down to 300 nm, repeatability(3sigma) is mostly in several nanometer range.
Critical dimension measurement, defect inspection, review for mask
Available for mask size up to 14 inch and customized mask shape
Visible and UV illumination available in transmitted and reflected modes
SECS/GEM
Low maintenance cost, stable and reliable
Mask critical dimension measurement
Available for mask size up to 6 inch
Visible and UV illumination available in transmitted and reflected modes
SECS/GEM
Low maintenance cost, stable and reliable
Mask film thickness and critical dimension measurement
Visible, UV and infrared illumination available
SECS/GEM
Low maintenance cost, stable and reliable
